The number of atoms ejected per incident ion (atoms/ion) is called the sputtering yield, Y. Sputtering yield is dependent on the following: Energy of the ...

To avoid damage and contamination that could cause quality issues during the coating process, use simple precautions to store and handle cylidrical targets: ...

To determine your dynamic deposition rate, multiply the thickness of the coating you want to make in nanometers by the velocity of your substrate in meters per ...

Each target material and coating process has limitations as to how fast the material can be deposited from each magnetron. Thus each different process has a ...

The length of the target tube is determined by the substrate length and the coating uniformity requirements. SCI refers to the overall length of the backing ...

You will need to provide four types of connection to your SCI rotary (cylindrical) magnetron: Cooling water for SCI rotary magnetrons: Provided to the ...

Large area substrates are usually wide flat rigid panels (such as glass or plastic) or wide flexible webs (typically plastic or metal) that are coated as they ...

Cost Lower initial capital investment: The initial capital investment for rotaries is less than typical planar cathodes for 1.5 m systems and larger. ...

Radio frequency (RF) sputtering is a type of SPUTTERING that is ideal for target materials that have insulating qualities. Like direct current (DC) sputtering, ...

Reactive sputtering is a type of SPUTTERING where a target of one chemical composition (e.g. elemental Si) is sputtered in the presence of a gas or a mixture ...