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Coating System

We manufactures and supplies vacuum coating plants, metallization vacuum, plasma, pvd, pecvd, sputtering, kolzer, metallizer, sputtering plant, sputter system, metalizacao vacuo, metallisation vide, metalizacion vacio, know-how of industrial vacuum coating applications, continuous and discontinuous high vacuum metallizers, industrial processes of finish.

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For many applications, such as OLED, OPV and OTFT research, and graphene and 2D materials, samples are sensitive to oxygen and moisture and handling within inert environments is a must. In these cases, deposition tools must allow for transfer to and from glovebox enclosures with controlled inert atmospheres. In addition to vacuum deposition, Moorfield can also equip glovebox-integrated tools with other hardware such as etching (including soft-etching) and annealing components.
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For many applications, such as OLED, OPV and OTFT research, and graphene and 2D materials, samples are sensitive to oxygen and moisture and handling within inert environments is a must. In these cases, deposition tools must allow for transfer to and from glovebox enclosures with controlled inert atmospheres. In addition to vacuum deposition, Moorfield can also equip glovebox-integrated tools with other hardware such as etching (including soft-etching) and annealing components.
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μ-650c systems tools take the modular concept to the pilot-scale level. Large chambers allow for increased-size component sets for coating large areas, and a range of load-lock options enable high-throughput operation. At the same time, systems are fully customisable to match specific applications.
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μ-570c systems have front-loading box-type chambers ideal for multiple-source magnetron sputtering but also thermal and e-beam evaporation.μ-570c  systems are glovebox-compatible for atmosphere-sensitive applications.μ-570c  systems offer tall chambers ideally suited for thermal, LTE and e-beam evaporation techniques requiring longer working distances for optimum uniformity.
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μ-450c systems have front-loading box-type chambers ideal for multiple-source magnetron sputtering but also thermal and e-beam evaporation.μ-450c  systems are glovebox-compatible for atmosphere-sensitive applications.
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