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The number of atoms ejected per incident ion (atoms/ion) is called the sputtering yield, Y. Sputtering yield is dependent on the following: Energy of the ...
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To avoid damage and contamination that could cause quality issues during the coating process, use simple precautions to store and handle cylidrical targets: ...
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To determine your dynamic deposition rate, multiply the thickness of the coating you want to make in nanometers by the velocity of your substrate in meters per ...
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Each target material and coating process has limitations as to how fast the material can be deposited from each magnetron. Thus each different process has a ...
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The length of the target tube is determined by the substrate length and the coating uniformity requirements. SCI refers to the overall length of the backing ...
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You will need to provide four types of connection to your SCI rotary (cylindrical) magnetron: Cooling water for SCI rotary magnetrons: Provided to the ...
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Large area substrates are usually wide flat rigid panels (such as glass or plastic) or wide flexible webs (typically plastic or metal) that are coated as they ...
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Cost Lower initial capital investment: The initial capital investment for rotaries is less than typical planar cathodes for 1.5 m systems and larger. ...
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Radio frequency (RF) sputtering is a type of SPUTTERING that is ideal for target materials that have insulating qualities. Like direct current (DC) sputtering, ...
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Reactive sputtering is a type of SPUTTERING where a target of one chemical composition (e.g. elemental Si) is sputtered in the presence of a gas or a mixture ...
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