To determine your dynamic deposition rate, multiply the thickness of the coating you want to make in nanometers by the velocity of your substrate in meters per minute.
Example: With SiO2 coating that is 20 nm thick and a substrate speed of 1.5 meters per minute, the dynamic deposition rate is 30 nm * m/min:
20 nm * 1.5 m/min = 30 nm * m/min
